رویکرد های نوین پرداخت سطح در مقیاس نانومتری و اتمی
Keywords:
پولیش, زبری, زیر نانومتر, سایش مکانیکیAbstract
این مقاله به بررسی رویکردهای پولیش در مقیاس اتمی و نزدیک به اتمی می پردازد و روش های مختلفی از جمله پولیش مکانیکی شیمیایی(CMP)، پولیش به کمک پلاسما (PAP)، وروش های بدون تغییر شیمیایی مانند ماشینکاری انتشار الاستیک (EEM) را معرفی میکند. این روش ها بر مبنای کاهش زبری سطح تا زیر نانومتر و حتی مقیاس آنگستروم طراحی شده اند.
کاربرد های صنعتی شامل بهبود کیفیت سطح در صنایع نوری، الکترونیک و اپتیک است. همچنین چالش هایی مانند هزینه بالا، بهینه سازی فرآیند ها و محدودیت در پردازش سطوح پیچیده نیز مورد بحث قرار گرفته اند. آینده این فن آوری ها به بهبود تعادل میان کارایی،دقت و هزینه وابسته است.
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